skip to main content

Explore Research Products in the NSF-PAR

  • Home
  • Search Results
  • Page 1 of 1

Search for: All records

Creators/Authors contains: "Hall, T."

Note: When clicking on a Digital Object Identifier (DOI) number, you will be taken to an external site maintained by the publisher. Some full text articles may not yet be available without a charge during the embargo (administrative interval).
What is a DOI Number?

Some links on this page may take you to non-federal websites. Their policies may differ from this site.

  1. ; ; ; ; ; ; ( , Journal of The Electrochemical Society)

    In this paper, we present the design of an effective pulse current deposition process for low stress, crack-free Cr coatings deposited from standard Cr3+electrolyte commonly used by industry. Parameters for pulse current deposition process such aston,toff,and duty cycle are based on detailed analysis and modeling of in situ stress transients during Cr deposition and relaxation. A general procedure and criterion are derived for pulse current function design which should be of broader significance for the synthesis of functional Cr coatings. Comparative characterization of pulse and direct current deposited Cr films is presented. These data illustrate superior properties and stress-state of the Cr films deposited using our newly developed approach to pulse current function design.

     
    more » « less
  2. ; ; ; ; ; ; ; ; ; ; et al ( , Plasma Research Express)
    Full Text Available 
  3. ; ; ; ; ; ; ; ; ; ; et al ( , Review of Scientific Instruments)
  4. ; ; ; ; ( , Physics of Plasmas)